Equipments & Facilities

• Range: -170^ºC  to 1300^ºC ; Maximum field 2.2 Tesla
• Ar, N₂

Hysteresis loops/magnetoelectric measurements (up to 1000 V) /time-dependent measurements

• T range: –170ºC to 1300ºC
• Maximum field 3.5 Tesla in Ar, N₂
• Fast acquisition rate (30 ms/point)

• Possibility to do co-sputtering (to grow alloy films)
• Ar,  reactive sputtering (for oxides and nitrides)

RF, DC generators for magnetron sputtering

• Possibility to do co-sputtering (to grow alloy films)
• Reactive sputtering (for oxides and nitrides)
• Automatized RF, DC generators for magnetron sputtering

• From 10 K to 600 K
• Maximum magnetic field 0.5 T
• Dipolar and Quadrupolar magnet

Longitudinal, transversal and polar MOKE configurations

• Fast acquisition rate (100 ms)
• Maximum magnetic field 2 T (in-plane and out-of-plane)
• Dipolar and Quadrupolar magnet

Longitudinal, transversal and polar MOKE configurations

• Equipped with ECD and FRA modules

Used to grow materials, mostly metals and alloys of varying dimensionality, and for electrocatalysis and corrosion experiments.

• With spectroelectrochemical module and booster

Used to grow materials, mostly metals and alloys of varying dimensionality, and for electrocatalysis and corrosion experiments

• 10^ºC - 40^ºC
• Relative humidity range: 10% to 90% RH.

Preparation of thin/porous layers by dipping solid substrates into the solution

Spin process applications of wafers and other substrates

• Load-displacement curves, range: 0.5 – 500 mN.

For precise determination of mechanical properties (hardness or elastic modulus) of thin films, coatings, or patterned structures

• Finite element modelling
• Nanoindentation

For precise determination of mechanical properties (hardness or elastic modulus) of thin films, coatings, or patterned structures.

Manual probe station used for four-point  resistance measurements 

• Nanoindentation, CSM, scratch test

For precise determination of mechanical properties (hardness or elastic modulus) of thin films, coatings, or patterned structures

• Range: -50^ºC to 750^ºC
• Ar, Air

Modulated temperature-DSC

• Range: 0^ºC to 850^ºC
• Ar, Air

To study the thermal properties of materials, including phase transformations.

• Range: 0^ºC to 900^ºC
• Ar, Air

• Range: 20^ºC to 1500^ºC

Heat Theatments under vacum

• Range: 20^ºC to 1200^ºC
• Ar, Air,N₂, H₂, Ar+5%H₂

High Vacum

• Ar, N₂

Used to prepare metallic glasses

• Ar  < 1 ppm O₂ & H₂O

Surface polishing down to 0,05um

• 1-5g
• Ar, air

Used  for mixing, homogenising and reducing particle size (mechanical alloying)

• 5-20g
• Ar, Air, H₂

Used  for mixing, homogenising and reducing particle size (mechanical alloying)

Non-destructive technique for assessement of elastic constants

• To evaluate surface roughness of thin films (AFM)
• To observe magnetic domain patterns at remanence (MFM)

Scan window 20 micron x 20 micron

• Range: 0^ºC to 900^ºC
• Ar, Air

• In-situ magnetic fields
• High-voltage
• Environmental AFM and liquid cell

Scanning probe microscopy for multi-purpose surface characterization.